Asymmetric Split-Gate 4H-SiC MOSFET with Embedded Schottky Barrier Diode for High-Frequency Applications
نویسندگان
چکیده
4H-SiC Metal-Oxide-Semiconductor Field Effect Transistors (MOSFETs) with embedded Schottky barrier diodes are widely known to improve switching energy loss by reducing reverse recovery characteristics. However, it weakens the static characteristics such as specific on-resistance and breakdown voltage. To solve this problem, in paper, an Asymmetric Split Gate MOSFET diode (ASG-MOSFET) is proposed analyzed conducting a numerical TCAD simulation. Due asymmetric structure of ASG-MOSFET, has relatively narrow junction field-effect transistor width. Therefore, despite using split gate structure, effectively protects oxide dispersing high drain The (SBD) also next above Junction (JFET) region. Accordingly, since SBD share current path, does not increase RON,SP MOSFET. ASG-MOSFET improves both at same time. As result, compared conventional SBD, Baliga′s Figure Merit improved 17%, total reduced 30.5%, respectively.
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ژورنال
عنوان ژورنال: Energies
سال: 2021
ISSN: ['1996-1073']
DOI: https://doi.org/10.3390/en14217305